Deposition
Systems and Components for PLD, MBE, Magnetron Sputtering, Ion-Beam Etching, Spin Coaters, Rapid Thermal Annealing. Also: MiniMBE, Cold Atom Sources
MBE Systems
We offer design and implementation for Molecular Beam Epitaxy systems. Through our partnership with CreaTec and 25 years of expertise, we build MBE systems for any application you can envision.
MiniMBE
Epitaxial growth on small samples with a compact design. Features include a growth chamber, load-lock chamber, optional buffer chamber, up to 11 effusion cells, face-down zero force substrate transfer, linear shutters, substrate rotation. Adaptable for LT-STM/AFM investigations with minimized LN2 and LHe consumption.
Sputter Deposition - 032 PRIMS
Simply and fully functional sputter deposition unit for reproducible thin film layers. Features 3 ports for magnetron sputtering sources, supports co-deposition, substrate stage for up to 2-inch samples with heating and rotation options.
Semi-industrial MS Systems
Semi-production HV system for fast and repeatable processes with maximized automation. Combines DC/RF magnetron sputtering, reactive sputtering, and electron beam evaporation. Includes touch-screen interface with user-friendly software.
Evaporators
CreaTec Effusion Cells for ultra-high vacuum evaporation generating ultrapure molecular and atomic beams from a large variety of elements and compounds. Operating temperature range from -60 degrees C to 2400 degrees C.
